LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, LITHOGRAPHY SYSTEM, AND METHOD OF MANUFACTURING ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a lithography apparatus advantageous for forming a pattern on a substrate with high accuracy.SOLUTION: A lithography apparatus for patterning a substrate includes a first application unit for applying a first dose to a substrate on the basis of the data corresponding to the pattern, an acquisition unit for acquiring the information about the dimensional error of the pattern formed by application of the first dose by the first application unit, and a second application unit for applying a second dose to the substrate on the basis of the information about the error acquired in the acquisition unit.