| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma measuring device capable of restraining adhesion of evaporation particles.SOLUTION: A plasma measuring device 30 comprises a probe 41, and first and second covers 42, 43. The first and second covers 42, 43 are arranged to cover the probe 41, and switched between a state for shielding the probe 41 from plasma and a state for exposing the probe 41 to the plasma. While the first and second covers 42, 43 are relatively moved so that an opening 43a of the second cover 43 is opposed to any opening 42a of the first cover 42, the probe 41 is exposed to the plasma through the openings 42a, 43a of the first and second covers 42, 43. While the first and second cover 42, 43 are relatively moved so that the opening 43a of the second cover 43 is not opposed to any opening 42a of the first cover 42, the probe 41 is shielded from the plasma. |
