| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive paste which enables the formation of a fine and high-aspect-ratio wiring pattern.SOLUTION: A photosensitive paste comprises one or more photoreactive monomer and one or more alkali-soluble polymer. The number of curable functional groups of the photoreactive monomer is four or more. A side chain comprising an alkyl group with the number of carbon atoms of eight or more is introduced into the alkali-soluble polymer. The acid value of the alkali-soluble polymer is 20 KOHmg/g or more. |
