| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of forming an observation sample capable of obtaining an accurate and high-contrast cross-sectional shape, in which an influence of a material used for a coating layer upon the sample is made extremely small when the sample is covered with the coating layer, as being requested in accordance with microfabrication of a device element.SOLUTION: A sample 10 is formed by forming a coating layer 3 of a Si single body around a resist pattern 2 (or an organic material layer or semiconductor material layer), which is formed on a principal surface 1 of a semiconductor substrate, by a sputtering method by which a DC voltage is applied with a magnetic force acting. The resist pattern is cross-sectionally cut with it covered with the Si single body coating layer, thereby exposing the resist pattern in high contrast.</p> |
