FACILITY FOR MANUFACTURING SEMICONDUCTOR AND CERAMIC FILM COATING METHOD OF THE SAME

摘要

The present invention discloses a semiconductor fabricating equipment and a method of coating a ceramic thin layer. The method of coating a ceramic thin layer includes: providing a ceramic powder; injecting an impurity into the ceramic powder; and spraying the ceramic powder, in which the impurity is injected, in a chamber to coat a ceramic thin layer on an inner wall of the chamber. In this case, the ceramic powder includes an iridium oxide layer.