发明名称 |
PHOTORESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID GENERATOR, AND PHOTODEGRADABLE BASE |
摘要 |
<p>A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R1 s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R1 and the carbon atom(s) constituting R2 and bonding to these oxygen atoms. M+ represents a monovalent radiation-degradable onium cation.</p> |
申请公布号 |
KR20140139511(A) |
申请公布日期 |
2014.12.05 |
申请号 |
KR20147026723 |
申请日期 |
2013.02.22 |
申请人 |
JSR CORPORATION |
发明人 |
NAMAI HAYATO;NAKAHARA KAZUO;IKEDA NORIHIKO |
分类号 |
G03F7/039;C07D317/70;G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|