PIEZOELECTRIC THIN FILM AND METHOD FOR PRODUCING SAME

摘要

A piezoelectric thin film (1) which is obtained by means of sputtering and is formed of scandium aluminum nitride. This piezoelectric thin film has a carbon atom content of 2.5 at% or less. In order to produce this piezoelectric thin film (1), scandium and aluminum are sputtered onto a substrate (21) at the same time from a scandium aluminum alloy target material (10) that has a carbon atom content of 5 at% or less in an atmosphere that contains at least a nitrogen gas. Sputtering may be carried out by irradiating the facing surface of the alloy target material with an ion beam (31) from a direction that is inclined to the facing surface. In addition, scandium and aluminum may be sputtered onto the substrate from an Sc target and from an Al target at the same time. Consequently, a piezoelectric thin film that exhibits excellent piezoelectric characteristics and a method for producing the piezoelectric thin film are able to be provided.