发明名称 LASER CHAMPERING APPARATUS FOR SUBSTRATE
摘要 <p>The present invention relates to a substrate chamfering apparatus using laser. Provided is a substrate chamfering apparatus using laser which radiates a laser beam on a substrate edge portion along a chamfering line for a high-quality chamfering work which is more accurate and results in a smooth cut surface, and uses laser for the chamfering work, thereby forming the chamfering line in a straight line or a curve to variously form chamfering lines of an appropriate shape according to the type and usage of a substrate, further improving substrate strength to lower the defect rate in a manufacturing process, and securing available space due to the chamfering to make various shapes of design.</p>
申请公布号 KR20140138421(A) 申请公布日期 2014.12.04
申请号 KR20130058473 申请日期 2013.05.23
申请人 INNO6 INC. 发明人 LEE, HYUN CHUL
分类号 B23K26/38;B23K26/00;B23K26/02;B23K26/10 主分类号 B23K26/38
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