| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt used in a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).SOLUTION: A resist composition contains a resin containing a structural unit having an acid-labile group, a carboxylic acid onium salt, and an acid generator represented by formula (II). [In the formula (II), Rrepresents a C1-C24 hydrocarbon group; -CH- contained in the hydrocarbon group may be substituted with -O- or -CO-; and Zrepresents an organic cation.] |
