PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACER, AND SPACER PREPARED THEREFROM

摘要

The present invention relates to a photosensitive resin composition for forming a spacer, and more specifically, to a photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent, wherein the alkali-soluble resin comprises an alicyclic epoxy group and an aliphatic epoxy group, thereby allowing a spacer to be prepared having an excellent elastic recovery rate and having a hardness enabling little deformation from external pressure.