| 摘要 |
<p>The invention relates to a mask, carrier arrangement, method and use for preventing material growth on a portion of a surface (4, 6, 10, 12) of a substrate (2, 8) during processing of the substrate (2, 8) by subjecting the surface (4,6, 10, 12) of the substrate (2, 8) to successive surface reactions of at least a first precursor and a second precursor. The mask being arranged to be placed on the substrate (2, 8) such that it covers the portion of the surface (4, 6, 10, 12) of the substrate (2, 8). In the present invention the mask comprises a porous element (20, 24, 29, 32, 42, 44, 54) arranged to be provided against at least part of the portion of the surface (4, 6, 10, 12) of the substrate (2, 8).</p> |
