发明名称 ELECTROPLATING BATHS OF SILVER AND TIN ALLOYS
摘要 Silver and tin alloy electroplating baths include complexing agents which enable the electroplating of either silver rich or tin rich alloys. The silver and tin alloy electroplating baths are substantially free of lead. They may be used to electroplate silver and tin alloys in the manufacture of electronic components such as electrical connectors, finishing layers for metallic substrates, decorative applications and solder bumps.
申请公布号 US2014353162(A1) 申请公布日期 2014.12.04
申请号 US201313910109 申请日期 2013.06.04
申请人 Rohm and Haas Electronic Materials LLC 发明人 FOYET Adolphe;CLAUSS Margit;ZHANG-BEGLINGER Wan;WOERTINK Julia;QIN Yi;PRANGE Jonathan;LOPEZ MONTESINOS Pedro O.
分类号 C25D3/60;H01L23/00 主分类号 C25D3/60
代理机构 代理人
主权项 1. An electroplating bath comprising one or more sources of silver ions, one or more sources of tin ions, one or more compounds having a formula: X—S—Y  (I) wherein X and Y may be substituted or unsubstituted phenol groups, HO—R— or —R′S—R″—OH with the proviso that when X and Y are the same they are substituted or unsubstituted phenol groups otherwise X and Y are different and wherein R, R′ and R″ are the same or different and are linear or branched alkylene radicals having 1 to 20 carbon atoms; and one or more compounds having a formula: wherein M is hydrogen, NH4, sodium or potassium and R1 is substituted or unsubstituted, linear or branched (C2-C20)alky, or substituted or unsubstituted (C6-C10)aryl.
地址 Marlborough MA US