发明名称 IMMERSION LIQUID REPLENISHING APPARATUS, REPLENISHING METHOD, AND WAFER SCRIBING LINES INSPECTION MACHINE WITH IMMERSION LIQUID REPLENISHING APPARATUS
摘要 The present invention discloses an immersion liquid replenishing apparatus, a replenishing method, and a wafer scribing lines inspection machine with the immersion liquid replenishing apparatus. The immersion liquid replenishing apparatus inputs an immersion liquid from a first pipe of the cover and outputs the immersion liquid from a second pipe of the bottom of a reservoir. The replenishing method comprises the steps of providing an immersion liquid replenishing apparatus, feeding an immersion liquid, forming a film, and discharging the immersion liquid. The production and preparation of the apparatus and method of the invention is convenient and cheap. During a process of wafer scribing lines inspection, the wafer scribing lines inspection machine with the immersion liquid replenishing apparatus has enough immersion liquid to form the film and discharges excess immersion liquid.
申请公布号 US2014354965(A1) 申请公布日期 2014.12.04
申请号 US201313948860 申请日期 2013.07.23
申请人 Yayatech Co., Ltd. 发明人 CHEN Ying-Cheng;Lin Sheng-Feng;Chen Li-Chueh;Chen Yi-Chien
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An immersion liquid replenishing apparatus for use in wafer scribing lines inspection, the immersion liquid replenishing apparatus comprising: a casing comprising an upper case portion, a lower case portion corresponding in position to the upper case portion, and a lateral case portion extending from an edge of the upper case portion to an edge of the lower case portion, wherein the upper case portion is provided centrally with a first through hole, and the lower case portion is provided centrally with a second through hole; a cover fixedly coupled to the casing and adapted to conceal the upper case portion, wherein a first gap is formed between the cover and the upper case portion, the cover having a third through hole and a first pipe coupled to a side of the cover, the third through hole being in connection with the first through hole, the third through hole being larger than the first through hole and adapted to conceal the first through hole, the first pipe having a first end aperture extending out of the cover and a second end aperture extending to the first gap; a transparent plate fixedly coupled to the upper case portion, adapted to conceal the first through hole, and being smaller than the third through hole, wherein a second gap is formed between the transparent plate and the third through hole; a film formed from an immersion liquid and on the transparent plate to conceal the transparent plate; and a cylindrical storage chamber fixed to the lateral case portion and having a recess portion and a second pipe, wherein the cover extends to an inner lateral side of the recess portion, whereas the second pipe penetrates a bottom side of the recess portion and extends out of the cylindrical storage chamber.
地址 Hsin-Chu TW