发明名称 INTEGRATED HALL EFFECT SENSOR
摘要 The generation of a Hall voltage within a semiconductor film of an integrated Hall effect sensor uses the flow of a current within the semiconductor film when subjected to a magnetic field. The film is disposed on top of an insulating layer, referred to as buried layer, which is itself disposed on top of a carrier substrate containing a buried electrode that is situated under the insulating layer. A biasing voltage is applied to the buried electrode.
申请公布号 US2014354276(A1) 申请公布日期 2014.12.04
申请号 US201414286431 申请日期 2014.05.23
申请人 STMicroelectronics SA 发明人 Trochut Severin;Remond Eric
分类号 G01R33/07;H01L43/06;H01L43/04 主分类号 G01R33/07
代理机构 代理人
主权项 1. A method for generating a Hall voltage within a semiconductor film disposed on top of an insulating layer which is disposed on top of a carrier substrate containing a buried electrode situated under the insulating layer, comprising: flowing a current within the semiconductor film that is subjected to a magnetic field, and biasing the buried electrode with a bias voltage.
地址 Montrouge FR