发明名称 |
INTEGRATED HALL EFFECT SENSOR |
摘要 |
The generation of a Hall voltage within a semiconductor film of an integrated Hall effect sensor uses the flow of a current within the semiconductor film when subjected to a magnetic field. The film is disposed on top of an insulating layer, referred to as buried layer, which is itself disposed on top of a carrier substrate containing a buried electrode that is situated under the insulating layer. A biasing voltage is applied to the buried electrode. |
申请公布号 |
US2014354276(A1) |
申请公布日期 |
2014.12.04 |
申请号 |
US201414286431 |
申请日期 |
2014.05.23 |
申请人 |
STMicroelectronics SA |
发明人 |
Trochut Severin;Remond Eric |
分类号 |
G01R33/07;H01L43/06;H01L43/04 |
主分类号 |
G01R33/07 |
代理机构 |
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代理人 |
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主权项 |
1. A method for generating a Hall voltage within a semiconductor film disposed on top of an insulating layer which is disposed on top of a carrier substrate containing a buried electrode situated under the insulating layer, comprising:
flowing a current within the semiconductor film that is subjected to a magnetic field, and biasing the buried electrode with a bias voltage. |
地址 |
Montrouge FR |