发明名称 DEVICE AND METHOD FOR THE TREATMENT OF FLAT MATERIAL TO BE TREATED
摘要 The device (1) according to the invention is suggested for gentle treatment of a flat material (B) to be treated with a treatment liquid (F). The device (1) has the following components: at least one treatment chamber (20), in which the treatment liquid (F) can be accumulated up to a bath level (M), at least one supply device (7) for the supply of the treatment liquid (F) into the at least one treatment chamber (20), at least one transport device (30), with which the material (B) to be treated can be transported in the horizontal position in a transport plane (E) below the bath level (M) through the at least one treatment chamber (20), at least one reception area (4) for the treatment liquid (F), and at least one discharge device (40) with, respectively, at least one discharge opening (41) for the treatment liquid (F) for conveying it from the at least one treatment chamber (20) with a respective discharge rate into the at least one reception area (4). The at least one discharge device (40) respectively has at least one regulating system (43), with which the discharge rate of the treatment liquid (F) is adjustable through the at least one discharge opening (41).
申请公布号 WO2014076078(A3) 申请公布日期 2014.12.04
申请号 WO2013EP73617 申请日期 2013.11.12
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 WIENER, FERDINAND;THOMAS, CHRISTIAN;LORENZ, OLAF
分类号 C25D7/06;C23C18/16;C25D17/00 主分类号 C25D7/06
代理机构 代理人
主权项
地址