NON-PLASMA DRY ETCHING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a non-plasma dry etching apparatus for processing plural boards simultaneously to form texture capable of uniformly forming the texture with uniform reflectance on every planes of the boards while reducing the size of the apparatus.SOLUTION: Boards are placed on multiple steps so that the boards are parallel to the flow of process gas in a reaction chamber. A turbulent flow generating blade is provided at the upstream side of the flow to achieve uniform etching.