SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a salt used in a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).SOLUTION: The salt is represented by formula (I). [In the formula (I), Rand Reach independently represent a C1-C4 alkyl group having fluorine atoms or are bonded to each other to form a C2-C8 divalent hydrocarbon group having fluorine atoms; Rrepresents a C1-C12 alkyl group, wherein -CH- contained in the alkyl group may be substituted with -O- or -CO-; n represents an integer of 0-3; and when n is 2 or more, a plurality of R's are the same or different.]