| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electro-optic device, an electro-optic device, and an electronic apparatus, in which reliability can be improved.SOLUTION: The method for manufacturing an electro-optic device includes the steps of: forming insulating layers 11c, 11d on a first substrate 10a; forming an aluminum film 12a and a nitride film 12b; forming a contact hole CNT80; forming a color filter 80 by filling the contact hole CNT80 with a color filter material; forming a fourth insulating layer 11e; forming a contact hole CNT5 in the fourth insulating layer 11e; forming a protective film 13 in the contact hole CNT5; forming a contact hole in a bottom of the contact hole CNT5 to expose the nitride film 12b; subjecting the contact holes CNT5, 6 to a fluoric acid treatment; and burying an ITO film in the contact holes CNT5, 6 and forming a pixel electrode by patterning on the protective film 13.</p> |
