| 发明名称 |
Abrasive Agent For Substrates And Substrate Manufacturing Method |
| 摘要 |
Provided is an abrasive agent for substrates that includes, as an abrasive material component in the abrasive agent, cerium oxide as the main component. The abrasive agent for substrates includes soluble silica and cerium oxide. The concentration ratio of the soluble silica, calculated as Si content, and the cerium oxide in the abrasive agent is 0.001:1 to 0.1:1. |
| 申请公布号 |
US2014357162(A1) |
申请公布日期 |
2014.12.04 |
| 申请号 |
US201214369881 |
申请日期 |
2012.12.14 |
| 申请人 |
KONICA MINOLTA, INC. |
发明人 |
Nakae Hazuki |
| 分类号 |
C09K3/14;G11B5/84;B24B37/00 |
主分类号 |
C09K3/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An abrasive agent for substrates that includes, as an abrasive material component in the abrasive agent, cerium oxide as the main component,
the abrasive agent for substrates including soluble silica and cerium oxide, and a concentration ratio of the soluble silica, calculated as Si content, and the cerium oxide in the abrasive agent being 0.001:1 to 0.1:1. |
| 地址 |
Chiyoda-ku, Tokyo JP |
