发明名称 LASER PROCESSING USING AN ASTIGMATIC ELONGATED BEAM SPOT AND USING ULTRASHORT PULSES AND/OR LONGER WAVELENGTHS
摘要 <p>An adjustable astigmatic elongated beam spot may be formed from a laser beam having ultrashort laser pulses and/or longer wavelengths to machine substrates made of a variety of different materials. The laser beam may be generated with pulses having a pulse duration of less than 1 ns and/or having a wavelength greater than 400 nm. The laser beam is modified to produce an astigmatic beam that is collimated in a first axis and converging in a second axis. The astigmatic beam is focused to form the astigmatic elongated beam spot on a substrate, which is focused on the substrate in the first axis and defocused in the second axis. The astigmatic elongated beam spot may be adjusted in length to provide an energy density sufficient for a single ultrashort pulse to cause cold ablation of at least a portion of the substrate material.</p>
申请公布号 WO2014194179(A1) 申请公布日期 2014.12.04
申请号 WO2014US40192 申请日期 2014.05.30
申请人 IPG MICROSYSTEMS LLC 发明人 SERCEL, JEFFREY P.,;MENDES, MARCO,
分类号 B23K26/352 主分类号 B23K26/352
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