发明名称 ELECTRODE FOR USE WITH A MANUFACTURING APPARATUS FOR DEPOSITING A MATERIAL
摘要 An electrode for use with a manufacturing apparatus to deposit a material onto a carrier body and to circulate a coolant through said electrode. The electrode includes a shaft having a first end and a second end spaced from each other. Also included is a head disposed on said second end of said shaft. Further included is a channel defined by an interior surface of said shaft, the channel extending from the first end to a terminal end, wherein the terminal end comprises a non-planar geometry, the channel configured to route the coolant therethrough. Yet further included is a channel coating disposed on said interior surface for maintaining thermal conductivity between said electrode and the coolant, wherein said head has an exterior surface and a head coating is disposed on said exterior surface of said head.
申请公布号 US2014353290(A1) 申请公布日期 2014.12.04
申请号 US201414457401 申请日期 2014.08.12
申请人 Hemlock Semiconductor Corporation 发明人 Dehtiar Max;Hillabrand David;Knapp Theodore;McCoy Keith;Molnar Michael
分类号 B23K10/02 主分类号 B23K10/02
代理机构 代理人
主权项 1. An electrode for use with a manufacturing apparatus to deposit a material onto a carrier body and to circulate a coolant through said electrode, said electrode comprising: a shaft having a first end and a second end spaced from each other; a head disposed on said second end of said shaft; a channel defined by an interior surface of said shaft, the channel extending from the first end to a terminal end, wherein the terminal end comprises a non-planar geometry, the channel configured to route the coolant therethrough; and a channel coating disposed on said interior surface for maintaining thermal conductivity between said electrode and the coolant, wherein said head has an exterior surface and a head coating is disposed on said exterior surface of said head.
地址 Hemlock MI US