| 发明名称 |
PHOTORESISTS COMPRISING CARBAMATE COMPONENT |
| 摘要 |
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer. |
| 申请公布号 |
US2014356785(A1) |
申请公布日期 |
2014.12.04 |
| 申请号 |
US201313907789 |
申请日期 |
2013.05.31 |
| 申请人 |
The Dow Chemical Company |
发明人 |
Williams, III William;Liu Cong;Xu Cheng-Bai |
| 分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photoresist composition comprising:
(a) a resin; (b) an acid generator; and (c) a carbamate compound that comprises i) a carbamate group and ii) an ester group. |
| 地址 |
Marlborough MA US |
