CHARGED PARTICLE BEAM IRRADIATION APPARATUS, METHOD FOR IRRADIATION OF CHARGED PARTICLE BEAM, AND METHOD FOR MANUFACTURING ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation apparatus capable of correcting the deviation of a drawing position caused by charge distribution on a substrate surface.SOLUTION: A drawing apparatus according to the present invention includes: a charged particle optical system configured to irradiate a substrate with a charged particle beam; a control unit configured to control an irradiation position of the charged particle beam; and a first measurement unit and a second measurement unit each configured to measure a surface position of the substrate. The first measurement unit and the second measurement unit have different characteristics in terms of charging. The control unit controls the irradiation position of the charged particle beam on the basis of values measured by the first measurement unit and the second measurement unit.