发明名称 BIOSENSOR AND METHOD FOR MANUFACTRUING SAME
摘要 Disclosed is a method for manufacturing a biosensor comprising (a) forming an insulating layer in an electrode region; (b) coating the first photoresist layer on the insulating layer; (c) performing the firs exposing process on the first electrode region through the first photomask; (d) removing unexposed area of the first photoresist layer except for the first electrode region using development; (e) coating the second photoresist layer on the first electrode region and the insulating layer after the step (d); (f) performing the second exposing process on the second electrode regions through the second photomask; (g) performing the third exposing process on the top portion of the second photoresist layer through a photomask with open areas in the shape of micro-sized wires connecting the second electrode regions; (h) removing the second photoresist layer except for the portions exposed in the steps (c), (f) and (g) using development.
申请公布号 US2014353152(A1) 申请公布日期 2014.12.04
申请号 US201214369199 申请日期 2012.04.02
申请人 Shin Heung Joo;Heo Jeong II;Lim Yeong Jin 发明人 Shin Heung Joo;Heo Jeong II;Lim Yeong Jin
分类号 G01N27/30 主分类号 G01N27/30
代理机构 代理人
主权项 1. A method for manufacturing a biosensor, comprising: (a) forming an insulating layer in an electrode region including the first electrode region and a plurality of the second electrode regions on a substrate; (b) coating the first photoresist layer on the insulating layer; (c) performing the first exposing process on the first electrode region through the first photomask; (d) removing unexposed area of the first photoresist layer except for the first electrode region using development; (e) coating the second photoresist layer on the first electrode region and the insulating layer after the step (d); (f) performing the second exposing process on the second electrode regions through the second photomask; (g) performing the third exposing process on the top portion of the second photoresist layer through a photomask with open areas in the shape of micro-sized wires connecting the second electrode regions; (h) removing the second photoresist layer except for the portions exposed in the steps (c), (f) and (g) using development; and (i) pyrolyzing the first and second electrode regions and the wire to form carbon electrodes and carbon wires.
地址 Ulsan KR