发明名称 |
BIOSENSOR AND METHOD FOR MANUFACTRUING SAME |
摘要 |
Disclosed is a method for manufacturing a biosensor comprising (a) forming an insulating layer in an electrode region; (b) coating the first photoresist layer on the insulating layer; (c) performing the firs exposing process on the first electrode region through the first photomask; (d) removing unexposed area of the first photoresist layer except for the first electrode region using development; (e) coating the second photoresist layer on the first electrode region and the insulating layer after the step (d); (f) performing the second exposing process on the second electrode regions through the second photomask; (g) performing the third exposing process on the top portion of the second photoresist layer through a photomask with open areas in the shape of micro-sized wires connecting the second electrode regions; (h) removing the second photoresist layer except for the portions exposed in the steps (c), (f) and (g) using development. |
申请公布号 |
US2014353152(A1) |
申请公布日期 |
2014.12.04 |
申请号 |
US201214369199 |
申请日期 |
2012.04.02 |
申请人 |
Shin Heung Joo;Heo Jeong II;Lim Yeong Jin |
发明人 |
Shin Heung Joo;Heo Jeong II;Lim Yeong Jin |
分类号 |
G01N27/30 |
主分类号 |
G01N27/30 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a biosensor, comprising:
(a) forming an insulating layer in an electrode region including the first electrode region and a plurality of the second electrode regions on a substrate; (b) coating the first photoresist layer on the insulating layer; (c) performing the first exposing process on the first electrode region through the first photomask; (d) removing unexposed area of the first photoresist layer except for the first electrode region using development; (e) coating the second photoresist layer on the first electrode region and the insulating layer after the step (d); (f) performing the second exposing process on the second electrode regions through the second photomask; (g) performing the third exposing process on the top portion of the second photoresist layer through a photomask with open areas in the shape of micro-sized wires connecting the second electrode regions; (h) removing the second photoresist layer except for the portions exposed in the steps (c), (f) and (g) using development; and (i) pyrolyzing the first and second electrode regions and the wire to form carbon electrodes and carbon wires. |
地址 |
Ulsan KR |