发明名称 GAS BARRIER FILM
摘要 <p>The present invention provides, as gas barrier film having improved adhesiveness between a base material and a barrier laminate, a gas barrier film including a plastic film, an organic layer and an inorganic layer in this order, the gas barrier film having a silicon compound layer including one or more compounds selected from the group consisting of silicon oxide, silicon nitride and silicon carbide between the plastic film and the organic layer; the plastic film and the silicon compound layer, and the silicon compound layer and the organic layer being directly in contact to each other respectively; the thickness of the silicon compound layer being 40 nm or less; the organic layer being a layer formed of a composition containing a polymerizable compound and a silane coupling agent; and the thickness of the inorganic layer being larger than the thickness of the silicon compound layer.</p>
申请公布号 KR20140138853(A) 申请公布日期 2014.12.04
申请号 KR20147028004 申请日期 2013.02.28
申请人 FUJIFILM CORPORATION 发明人 NAKAMURA SEIGO;SUZUKI SHINYA
分类号 B32B9/00;B32B27/06;B32B27/20;B32B33/00 主分类号 B32B9/00
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