| 摘要 |
<p>Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. In the formula, R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R2, R3, R4, and R5 independently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) R2 and R3, or R4 and R5, may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) R3 and R4 may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R2, R3, R4, and R5 are not a hydrogen atom at the same time.</p> |
