发明名称 |
APPARATUS AND PROCESS FOR ATOMIC LAYER DEPOSITION WITH HORIZONTAL LASER |
摘要 |
<p>Provided are atomic layer deposition apparatus and methods including a gas distribution plate and at least one laser source emitting a laser beam adjacent the gas distribution plate to activate gaseous species from the gas distribution plate. Also provided are gas distribution plates with elongate gas injector ports where the at least one laser beam is directed along the length of the elongate gas injectors.</p> |
申请公布号 |
KR20140138282(A) |
申请公布日期 |
2014.12.03 |
申请号 |
KR20147028649 |
申请日期 |
2013.03.11 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
THOMPSON DAVID;NARWANKAR PRAVIN K.;SRINIVASAN SWAMINATHAN;CHATTERJEE SUKTI;MAYUR ABHILASH;MAQSOOD KASHIF |
分类号 |
C23C16/44;C23C16/50 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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