| 摘要 |
PROBLEM TO BE SOLVED: To provide a porous insulating film in which the etching damage can be improved while maintaining the low dielectric constant and the mechanical strength of the insulating film, as it is, without requiring any complicated control, or the like, in the process, and to provide a method of producing the same. SOLUTION: The method of producing a porous insulating film includes (1) a step for forming a porous insulating film of a composition containing a compound having a siloxane structure, (2) a step for backfilling the porous part by coating the porous insulating film with a filler, and forming a polymer coated layer derived from the filler on the porous insulating film, and (3) a step for removing the polymer coated layer derived from the filler, and removing the filler in the vacancy thus backfilled. COPYRIGHT: (C)2012,JPO&INPIT |
