METAL SOURCE SUPPLYING UNIT AND DEPOSITION FILM FORMING APPARATUS HAVING THE SAME

摘要

The present invention relates to a gas supply device. According to an embodiment of the present invention, provided is a metal source supply device which includes: a chamber which receives a material including liquid metal; a flow path for transferring the material including liquid metal discharged from the chamber; a flux controlling unit which controls the flux of the material including liquid metal transferred on the flow path; and an injection unit which injects the material including liquid metal controlled by the flux controlling unit.