发明名称 真空処理装置及び有機薄膜形成方法
摘要 <p>The purposes of the present invention are to improve use efficiency of an apparatus and to improve use efficiency of an organic compound material. In the present invention, a plurality of organic thin film-forming apparatuses (11-17) are connected in series, and in each of the organic thin film-forming apparatuses (11-17), a subject on which a film is to be formed is disposed on each of the two paths, i.e., a left transfer path and a right transfer path. After organic compound vapor supplied from an organic compound vapor generating apparatus is discharged to the subject on one path and an organic thin film is formed, discharge of the vapor to the subject on the other path is started. Since the organic thin films can be alternately formed on the left and right transfer paths, use efficiency of the apparatus is high. Furthermore, if preparation for the organic thin film formation is completed on the other transfer path prior to completing the organic thin film formation on the one transfer path, the organic thin films can be alternately formed without leading the organic compound vapor to a trap.</p>
申请公布号 JP5634522(B2) 申请公布日期 2014.12.03
申请号 JP20120535030 申请日期 2011.09.20
申请人 发明人
分类号 C23C14/56;C23C14/12;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/56
代理机构 代理人
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