发明名称 |
OXIDE FILM CONTAINING INDIUM AND METHOD FOR MANUFACTURING SAME |
摘要 |
The present invention relates to an indium oxide film formed by chemical vapor deposition or atomic layer deposition, or to an oxide film containing indium, and to a method for forming same. By chemical vapor deposition or atomic layer deposition, wherein an indium material that is a liquid at room temperature is used, an oxide film containing indium can be formed on a substrate having a large area, and particularly a substrate for manufacturing a display device. |
申请公布号 |
EP2808302(A1) |
申请公布日期 |
2014.12.03 |
申请号 |
EP20130741343 |
申请日期 |
2013.01.28 |
申请人 |
UP CHEMICAL CO., LTD. |
发明人 |
KOH, WONYONG;KIM, BYUNGSOO;MA, DONG HWAN |
分类号 |
C01G15/00;C23C16/06;C23C16/40 |
主分类号 |
C01G15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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