发明名称 描画方法及び描画装置
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a drawing apparatus capable of obtaining an irradiation dose for which a proximity effect is corrected more highly accurately. <P>SOLUTION: The drawing apparatus 100 of one embodiment includes: an irradiation dose calculation part 112 for determining the irradiation dose by solving the equation of storage energy by backscattering of a charged particle beam defined by a polynomial having the term of at least second order of the irradiation dose; and a drawing part 150 for drawing a pattern on a sample 101 by irradiation with an electron beam 200 by the determined irradiation dose. Drawing is executed by the irradiation dose with which the proximity effect is corrected more highly accurately. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP5636460(B2) 申请公布日期 2014.12.03
申请号 JP20130067231 申请日期 2013.03.27
申请人 株式会社ニューフレアテクノロジー 发明人 阿部 隆幸;柴田 隼人;加藤 靖雄;松本 裕史;八島 純;飯島 智浩;本杉 知生;大西 孝幸;安瀬 博人
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
代理机构 代理人
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