| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a mask blank substrate and a method for manufacturing a mask blank, which are capable of recycling a mask blank substrate by, if a transfer mask is unavailable because of the existence of a defect or the like, removing traces of a transfer pattern remaining on a principal surface of the mask blank substrate which has been used in the transfer mask. <P>SOLUTION: The method for manufacturing a mask blank substrate uses a transfer mask where a thin film having a transfer pattern formed thereon is provided on the principal surface of the substrate, and includes a step of peeling the thin film of the transfer mask and a step of bringing a flame at a combustion temperature equal to or higher than a softening point of the substrate into contact with the principal surface of the substrate from which the thin film has been peeled. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
