发明名称 HOLDING MATERIAL FOR GAS TREATMENT DEVICE, GAS TREATMENT DEVICE, AND PRODUCTION PROCESSES THEREFOR
摘要 <p>Provided are a holding material for a gas treatment device, which is inexpensive, has a simple structure, and exhibits high holding force, a gas treatment device, and a method for manufacturing the same. A holding material for a gas treatment device according to the present invention is a holding material (10), which is a holding material to be arranged, in a gas treatment device (1) including a treatment structure (20) and a casing (40) for housing the treatment structure (20), between the treatment structure (20) and the casing (40), the holding material (10) including silica fibers and an alumina sol in an amount of 3 parts by mass or more in terms of a solid content with respect to 100 parts by mass of the silica fibers.</p>
申请公布号 EP2808511(A1) 申请公布日期 2014.12.03
申请号 EP20120866740 申请日期 2012.11.14
申请人 NICHIAS CORPORATION 发明人 SATOH, JUNYA;TOMOSUE, NOBUYA;ISOMURA, KAZUTOSHI;SATO, KIYOSHI;SAKANE, TADASHI;NAKAMURA, HIROKI
分类号 F01N3/28;B01D46/24;B01D53/86;C03C25/42;D21H13/38;F01N3/021 主分类号 F01N3/28
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