发明名称 PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM
摘要 A plating method can improve adhesivity with an underlying layer. The plating method of performing a plating process on a substrate includes forming a first plating layer 23a serving as a barrier film on a substrate 2; baking the first plating layer 23a; forming a second plating layer 23b serving as a barrier film; and baking the second plating layer 23b. A plating layer stacked body 23 serving as a barrier film is formed of the first plating layer 23a and the second plating layer 23b.
申请公布号 KR20140138161(A) 申请公布日期 2014.12.03
申请号 KR20147025413 申请日期 2013.02.22
申请人 TOKYO ELECTRON LIMITED 发明人 TANAKA TAKASHI;INATOMI YUICHIRO;MIZUTANI NOBUTAKA;SAITO YUSUKE;IWASHITA MITSUAKI
分类号 C23C18/16;C25D5/34 主分类号 C23C18/16
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