发明名称 MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE
摘要 A microwave radiation antenna (45) for irradiating microwaves propagated over a microwave propagation path into a chamber and generating a surface wave plasma has: an antenna unit (121) comprising a conductor; a plurality of slots (122) through which microwaves are irradiated, the slots (122) being provided in the antenna unit (121); and a plurality of gas discharge apertures (125) for discharging a processing gas into the chamber, the gas discharge apertures (125) being provided in the antenna unit (121). A dielectric layer (126) is provided so that a metallic surface wave is formed on a surface by the microwaves, a surface wave plasma is generated by the metallic surface wave, and at least a portion of the metallic surface of the antenna unit (121) is insulated in terms of direct current from the surface wave plasma.
申请公布号 KR20140137450(A) 申请公布日期 2014.12.02
申请号 KR20147029665 申请日期 2013.02.14
申请人 TOKYO ELECTRON LIMITED 发明人 IKEDA TARO;KOMATSU TOMOHITO;KASAI SHIGERU;NAKAGOMI JUN
分类号 H05H1/46;H01L21/3065;H01P5/103 主分类号 H05H1/46
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