发明名称 |
MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE |
摘要 |
A microwave radiation antenna (45) for irradiating microwaves propagated over a microwave propagation path into a chamber and generating a surface wave plasma has: an antenna unit (121) comprising a conductor; a plurality of slots (122) through which microwaves are irradiated, the slots (122) being provided in the antenna unit (121); and a plurality of gas discharge apertures (125) for discharging a processing gas into the chamber, the gas discharge apertures (125) being provided in the antenna unit (121). A dielectric layer (126) is provided so that a metallic surface wave is formed on a surface by the microwaves, a surface wave plasma is generated by the metallic surface wave, and at least a portion of the metallic surface of the antenna unit (121) is insulated in terms of direct current from the surface wave plasma. |
申请公布号 |
KR20140137450(A) |
申请公布日期 |
2014.12.02 |
申请号 |
KR20147029665 |
申请日期 |
2013.02.14 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
IKEDA TARO;KOMATSU TOMOHITO;KASAI SHIGERU;NAKAGOMI JUN |
分类号 |
H05H1/46;H01L21/3065;H01P5/103 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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