Polymerizable photoacid generators

摘要

A compound has formula (I):
Q-O-(A)-Z−G+  (I)
wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and G+ has formula (II):
;
wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

主权项

1. A copolymer comprising:
a first polymerized unit formed from a compound having the formulaor a combination comprising at least one of the foregoing, where each R1 is independently H, F, C1-6 alkyl, or C1-6 fluoroalkyl, and G+ has formula (VI):wherein R6, R7, and R8 are each independently hydroxy, nitrile, halogen, C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, C1-10 fluoroalkoxy, C6-20 aryl, C6-20 fluoroaryl, C6-20 aryloxy, or C6-20 fluoroaryloxy, r is an integer from 0 to 5, and s and t are each independently an integer from 0 to 4;
a second polymerized unit comprising an acid sensitive functional group; and a third polymerized unit comprising a polar group, wherein the third polymerized unit is formed from a polar monomer chosen fromor a combination comprising at least one of the foregoing, wherein R10 is H, F, C1-6 alkyl, or C1-6 fluoroalkyl.