发明名称 |
Sputtering device with gas injection assembly |
摘要 |
A sputtering device includes a chamber; and a substrate transferring unit for loading a substrate into, or unloading the substrate from the chamber, the substrate transferring unit including a gas injection assembly forming a gas cushion between the substrate and an upper surface of the substrate transferring unit. |
申请公布号 |
US8899565(B2) |
申请公布日期 |
2014.12.02 |
申请号 |
US201012797422 |
申请日期 |
2010.06.09 |
申请人 |
LG Display Co., Ltd. |
发明人 |
Kim Sung Eun |
分类号 |
C23C14/50 |
主分类号 |
C23C14/50 |
代理机构 |
McKenna Long & Aldridge LLP |
代理人 |
McKenna Long & Aldridge LLP |
主权项 |
1. A sputtering device, comprising:
a chamber; and a substrate transferring unit for loading a substrate into, or unloading the substrate from the chamber, the substrate transferring unit comprising a supporting unit for supporting the substrate, and a gas injection assembly mounted on the supporting unit and forming a gas cushion between the substrate and an upper surface of the substrate transferring unit, wherein the gas injection assembly comprises: a plurality of nozzle groups including a plurality of gas injection nozzles, the gas injection nozzles including an injection opening and a plurality of inlets arranged around the injection opening; gas flow amount controllers spaced from the gas injection nozzles with a certain interval; and at least one distance detecting sensor attached to a front surface of the gas injection assembly and provided at each of the nozzle groups, respectively, to individually measure a corresponding distance between the substrate and corresponding gas injection nozzles, wherein a height of the gas cushion is controlled based upon the measured distance and the gas flow amount controllers. |
地址 |
Seoul KR |