发明名称 Transferring medium manufacturing method and transferring medium
摘要 A transferring medium manufacturing method uses a base material, a recording material, and a non-recording material and causes the recording material to adhere to the base material. The transferring medium manufacturing method includes a recording material applying operation in which the recording material is applied to the base material. In a first non-recording material applying operation, the non-recording material is applied to a peripheral part of a recording material applied area. The peripheral part is located along an edge of the recording material applied area. The recording material applied area is an area of the base material where the recording material is applied. In a second non-recording material applying operation, the non-recording material is applied to an inner area, which is surrounded by, and/or located at a relatively inner area position in comparison with an area position of, the peripheral part of the recording material applied area.
申请公布号 US8900657(B2) 申请公布日期 2014.12.02
申请号 US201012852874 申请日期 2010.08.09
申请人 Seiko Epson Corporation 发明人 Matsuhashi Kunihiko
分类号 B05D5/10;B41M7/00;B41M3/00 主分类号 B05D5/10
代理机构 Workman Nydegger 代理人 Workman Nydegger
主权项 1. A transferring medium manufacturing method for manufacturing a transferring medium by using a base material, a recording material, and a non-recording material and by causing the recording material to adhere to the base material, the recording material being transferable to a target, the transferring medium manufacturing method comprising: recording material applying operation in which the recording material is applied to the base material; a first non-recording material applying operation in which the non-recording material is applied to a peripheral part of a recording material applied area, the peripheral part being located along an edge of the recording material applied area, the recording material applied area being an area of the base material where the recording material is applied; and a second non-recording material applying operation in which the non-recording material is applied to an inner area, which is surrounded by, and/or located at a relatively inner area position in comparison with an area position of, the peripheral part of the recording material applied area where the non-recording material is applied in the first non-recording material applying operation, wherein the non-recording material applied in the first non-recording material operation directly contacts the non-recording material applied in the second non-recording material operation to thereby form a bank that prevents the non-recording material applied in the second non-recording material operation to overflow, wherein the recording material applied to the recording material applied area forms into a recording material layer; and the non-recording material is applied onto the recording material layer to form into an adhesive layer that is used for adhesion of the recording material layer to the target.
地址 Tokyo JP