High efficiency solar cells fabricated by inexpensive PECVD

摘要

A photovoltaic device includes one or more layers of a photovoltaic stack formed on a substrate by employing a high deposition rate plasma enhanced chemical vapor deposition (HDR PECVD) process. Contacts are formed on the photovoltaic stack to provide a photovoltaic cell. Reduced defect zones are disposed adjacent to contact regions in portions of the photovoltaic cell and are formed by an anneal configured to improve overall performance.

主权项

1. A photovoltaic device, comprising:
one or more layers of a photovoltaic stack formed on a substrate by employing a high deposition rate plasma enhanced chemical vapor deposition (HDR PECVD) process, wherein the one or more layers include a buffer layer between a transparent electrode formed on the substrate and a p-type layer; contacts formed on the photovoltaic stack to provide a photovoltaic cell; and reduced defect zones disposed adjacent to contact regions in portions of the photovoltaic cell and formed by an anneal configured to improve overall performance, the anneal including a temperature of between about 155 degrees Celsius and about 250 degrees Celsius to render the reduced defect zones more conductive.