发明名称 |
Image sensor in which embedded photodiodes are arrayed |
摘要 |
In an image sensor 1 according to an embodiment of the present invention, a plurality of embedded photodiodes PD(m,n) are arrayed. Each of the embedded photodiodes PD(m,n) comprises a first semiconductor region 10 of a first conductivity type; a second semiconductor region 20 formed on the first semiconductor region 10 and having a low concentration of an impurity of a second conductivity type; a third semiconductor region 30 of the first conductivity type formed on the second semiconductor region 20 so as to cover a surface of the second semiconductor region 20; and a fourth semiconductor region 40 of the second conductivity type for extraction of charge from the second semiconductor region 20; the fourth semiconductor region 40 comprises a plurality of fourth semiconductor regions 40 arranged as separated, on the second semiconductor region 20. |
申请公布号 |
US8901628(B2) |
申请公布日期 |
2014.12.02 |
申请号 |
US201013201289 |
申请日期 |
2010.02.08 |
申请人 |
Hamamatsu Photonics K.K. |
发明人 |
Ota Keiichi;Takimoto Sadaharu;Watanabe Hiroshi |
分类号 |
H01L31/062;H01L31/113;H01L27/14;H01L27/146 |
主分类号 |
H01L31/062 |
代理机构 |
Drinker Biddle & Reath LLP |
代理人 |
Drinker Biddle & Reath LLP |
主权项 |
1. An image sensor in which a plurality of embedded photodiodes are arrayed, each of the plurality of embedded photodiodes comprising:
a first semiconductor region of a first conductivity type; a second semiconductor region formed on the first semiconductor region and having a low concentration of an impurity of a second conductivity type; a third semiconductor region of the first conductivity type formed on the second semiconductor region so as to cover a surface of the second semiconductor region; a fourth semiconductor region of the second conductivity type for extraction of charge from the second semiconductor region, the fourth semiconductor region having a plurality of fourth semiconductor regions arranged separated on the second semiconductor region; and a plurality of read-out transistors each arranged adjacently to a corresponding one of the plurality of embedded photodiodes, wherein each of the plurality of fourth semiconductor regions are arranged separated on the second semiconductor region and are connected to a corresponding interconnection, and each of the plurality of fourth semiconductor regions are formed as islands within a corresponding one of the plurality of embedded photodiodes, and the corresponding interconnection is connected to a corresponding one of the plurality of read-out transistors for reading out a corresponding fourth semiconductor region, wherein a semiconductor region that serves as a drain or as a source for each of the plurality of read-out transistors also serves as one of the plurality of fourth semiconductor regions in each of the plurality of embedded photodiodes. |
地址 |
Hamamatsu-shi, Shizuoka JP |