Resist composition, method of forming resist pattern and novel compound

摘要

A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R1 represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X1 represents divalent linking group; X2 represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q1 and Q2 represents F or fluorinated alkyl group; and W+ represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H2N+(X2)—X1—Y—O-A-C(Q1)(Q2)—SO3− generated by decomposition upon exposure].;

主权项

1. A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity,
wherein the acidic compound component (J) comprises a compound represented by general formula (J1) shown below:wherein R1 represents a hydrogen atom, a hydroxy group, a halogen atom, a linear or branched alkoxy group, a hydrocarbon group which may have a substituent, or a nitro group; m represents an integer of 0 to 4; n represents an integer of 0 to 3; Rx represents a hydrogen atom or a hydrocarbon group which may have a substituent; X1 represents a divalent linking group and X2 represents a hydrogen atom or a hydrocarbon group which may have a substituent, provided that X1 and X2 may be mutually bonded to form a ring with the nitrogen atom; Y represents a single bond or a carbonyl group, and A represents an alkylene group of 1 to 6 carbon atoms, provided that part of the methylene group constituting the alkylene group may be replaced with an oxygen atom or a carbonyl group, part or all of the hydrogen atoms constituting the alkylene group may be substituted with an aliphatic hydrocarbon group of 1 to 6 carbon atoms which may have a fluorine atom, and —Y—O-A- does not represent —C(═O)—O—C(═O)—; Q1 and Q2 each independently represents a fluorine atom or a linear or branched fluorinated alkyl group of 1 to 6 carbon atoms; and W+ represents a primary, secondary or tertiary ammonium coutercation which exhibits a pKa smaller than a pKa of H2N+(X2)—X1—Y—O-A-C(Q1)(Q2)—SO3− generated by decomposition upon exposure.