发明名称 Apparatus and process for passivating an SRF cavity
摘要 An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field.;Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided.
申请公布号 US8903464(B1) 申请公布日期 2014.12.02
申请号 US201012925503 申请日期 2010.10.23
申请人 Jefferson Science Associates, LLC 发明人 Myneni Ganapati Rao;Wallace John P.
分类号 H01L39/24;H01J23/20;H05H7/20 主分类号 H01L39/24
代理机构 代理人
主权项 1. A process for the production of a niobium cavity exhibiting high quality factors at high gradients comprising: a. placing the niobium cavity in a first chamber housed within a second chamber wherein the first and second chambers are adjacent an RF field generator; b. thermally treating the niobium cavity by high temperature in the first chamber while maintaining high vacuum in the first and the second chambers; and c. applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field.
地址 Newport News VA US