发明名称 |
Apparatus and process for passivating an SRF cavity |
摘要 |
An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field.;Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided. |
申请公布号 |
US8903464(B1) |
申请公布日期 |
2014.12.02 |
申请号 |
US201012925503 |
申请日期 |
2010.10.23 |
申请人 |
Jefferson Science Associates, LLC |
发明人 |
Myneni Ganapati Rao;Wallace John P. |
分类号 |
H01L39/24;H01J23/20;H05H7/20 |
主分类号 |
H01L39/24 |
代理机构 |
|
代理人 |
|
主权项 |
1. A process for the production of a niobium cavity exhibiting high quality factors at high gradients comprising:
a. placing the niobium cavity in a first chamber housed within a second chamber wherein the first and second chambers are adjacent an RF field generator; b. thermally treating the niobium cavity by high temperature in the first chamber while maintaining high vacuum in the first and the second chambers; and c. applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field. |
地址 |
Newport News VA US |