发明名称 Defect inspection apparatus and defect inspection method using the same
摘要 A defect inspection apparatus comprises a table on which a substrate is placed, a first detection unit which is disposed above the table to detect an optical signal from the substrate, a second detection unit which is disposed above the table to detect an electrical signal from the substrate, and a signal processing unit which is connected to the first detection unit and the second detection unit to detect a chemical defect using the optical signal and the electrical signal.
申请公布号 US8902412(B2) 申请公布日期 2014.12.02
申请号 US201213472145 申请日期 2012.05.15
申请人 Samsung Electronics Co., Ltd. 发明人 Sohn Young-Hoon;Yang Yu-Sin;Lee Sang-Kil
分类号 G01N21/00;G01N21/55;G01N21/95 主分类号 G01N21/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A defect inspection apparatus comprising: a table on which a substrate is placed; a first detection unit which is disposed above the table and which detects an optical signal from the substrate; a second detection unit which is disposed above the table and which detects an electrical signal from the substrate; and a signal processing unit which is connected to the first detection unit and the second detection unit and which detects a chemical defect using the optical signal and the electrical signal, wherein the signal processing unit detects a physical defect based on the optical signal, and detects an electrical defect based on the electrical signal, and detects a chemical defect based on an electrical defect which does not correspond to a physical defect.
地址 Suwon-si KR