发明名称 |
Defect inspection apparatus and defect inspection method using the same |
摘要 |
A defect inspection apparatus comprises a table on which a substrate is placed, a first detection unit which is disposed above the table to detect an optical signal from the substrate, a second detection unit which is disposed above the table to detect an electrical signal from the substrate, and a signal processing unit which is connected to the first detection unit and the second detection unit to detect a chemical defect using the optical signal and the electrical signal. |
申请公布号 |
US8902412(B2) |
申请公布日期 |
2014.12.02 |
申请号 |
US201213472145 |
申请日期 |
2012.05.15 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Sohn Young-Hoon;Yang Yu-Sin;Lee Sang-Kil |
分类号 |
G01N21/00;G01N21/55;G01N21/95 |
主分类号 |
G01N21/00 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A defect inspection apparatus comprising:
a table on which a substrate is placed; a first detection unit which is disposed above the table and which detects an optical signal from the substrate; a second detection unit which is disposed above the table and which detects an electrical signal from the substrate; and a signal processing unit which is connected to the first detection unit and the second detection unit and which detects a chemical defect using the optical signal and the electrical signal, wherein the signal processing unit detects a physical defect based on the optical signal, and detects an electrical defect based on the electrical signal, and detects a chemical defect based on an electrical defect which does not correspond to a physical defect. |
地址 |
Suwon-si KR |