发明名称 |
Alignment for backside illumination sensor |
摘要 |
Provided is an apparatus that includes an integrated circuit located in a first region of a substrate having first and second opposing major surfaces and an alignment mark located in a second region of the substrate and extending through the substrate between the first and second surfaces. |
申请公布号 |
US8900966(B2) |
申请公布日期 |
2014.12.02 |
申请号 |
US201314044716 |
申请日期 |
2013.10.02 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Liu Jen-Cheng;Yaung Dun-Nian;Wuu Shou-Gwo |
分类号 |
H01L23/544;H01L21/71 |
主分类号 |
H01L23/544 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A method comprising:
providing a substrate having a first region and second region, wherein the first region includes an integrated circuit; forming a recess in the second region of the substrate; forming a material within the recess in the second region of the substrate; forming another material within the recess, the another material being different than the material within the recess; and removing a portion of the substrate to expose a portion of the material, wherein the exposed material is an alignment mark. |
地址 |
Hsin-Chu TW |