发明名称 METHOD AND PARTICLE BEAM DEVICE FOR FOCUSING A PARTICLE BEAM.
摘要 <p>A system is provided for focusing a particle beam onto an irradiation position on a surface of an object and for imaging and/or processing the surface. The described system is based on the consideration that the focusing of a particle beam generated in the particle beam device onto the surface of an object is intended to be effected in a manner dependent on the height profile of the surface. Accordingly, parameters for setting the focusing in a manner dependent on the height profile of the surface should be chosen. During scanning of the particle beam over the surface of the object, the focusing for each scanning point is set using the parameters in such a way that the best possible focusing can be achieved. In order to achieve this, the described system provides for taking account of the height profile of the surface of the object when choosing the parameters.</p>
申请公布号 NL2008901(C) 申请公布日期 2014.12.01
申请号 NL20122008901 申请日期 2012.05.30
申请人 CARL ZEISS NTS GMBH 发明人 PREIKSZAS DIRK
分类号 H01J37/21;H01J37/28 主分类号 H01J37/21
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