| 摘要 |
<p>The present invention relates to a baffle device, a thin film depositing apparatus including the baffle device, and a thin film depositing method thereof. The baffle device comprises a first baffle, a first driving unit driving the first baffle to make a linear movement in a first direction such that a length of an opening hole formed by the baffle device in the first direction increases or decreases, a second baffle, and a second driving unit driving the second baffle to make a linear movement in a second direction such that a length of an opening hole formed by the baffle device in the second direction increases or decreases. According the the present invention, materials of different thicknesses can be deposited on different areas of the same substrate, thereby sufficiently using the effective area of the substrate, as well as combining multiple sets of experiments at the same time.</p> |
