发明名称 LOW-K DIELECTRICS OBTAINABLE BY TWIN POLYMERIZATION
摘要 <p>THE INVENTION RELATES TO A DIELECTRIC LAYER WITH A PERMITTIVITY OF 3.5 OR LESS COMPRISING A DIELECTRIC OBTAINABLE BY POLYMERIZING AT LEAST ONE TWIN MONOMER COMPRISING A) A FIRST MONOMER UNIT WHICH COMPRISES A METAL OR SEMIMETAL, AND B) A SECOND MONOMER UNIT WHICH IS CONNECTED TO THE FIRST MONOMER UNIT VIA A CHEMICAL BOND, WHEREIN THE POLYMERIZATION INVOLVES POLYMERIZING THE TWIN MONOMER WITH BREAKAGE OF THE CHEMICAL BOND AND FORMATION OF A FIRST POLYMER COMPRISING THE FIRST MONOMER UNIT AND OF A SECOND POLYMER COMPRISING THE SECOND MONOMER UNIT, AND WHEREIN THE FIRST AND THE SECOND MONOMER UNIT POLYMERIZE VIA A COMMON MECHANISM.</p>
申请公布号 MY152799(A) 申请公布日期 2014.11.28
申请号 MY2010PI04741 申请日期 2009.04.28
申请人 BASF SE 发明人 KLIPP, ANDREAS;LANGE, ARNO;HÄHNLE, HANS-JOACHIM
分类号 C08G73/02 主分类号 C08G73/02
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