| 摘要 |
The present invention relates to a scan and step exposer and, more specifically, to new concept technology in which a light exposing module wholly and equally exposes a large exposed object (film, wafer) without a circuit pattern to light by performing light exposing work once, while continuously or repeatedly stepping in a scan type. As to an existing light exposing device, as a light exposing module is fixed in a set position so the standard of an exposable object is limited according to specification of the light exposing module, the usability of the light exposing device is degraded since an exposed object longer than the light exposing module is not able to be exposed to light with one-time work. And to expose the longer exposed object to the light by one-time work, the standard of the light exposing module needs to be excessively larger, which is irrational. To solve this problem, the present invention is capable of inserting a chuck tray into a lower side of a mask holder after attaching the exposed object to the chuck tray taken out, including a glass base to which a film mask having a circuit pattern is attached in an upper part of the mask holder, and controlling a gap between the glass base and the exposed object by moving the mask holder up and down while continuously transferring or repeatedly stepping the light exposing module in the upper part of the mask holder in a scan type in a transverse direction. |
