发明名称 SELF PLASMA CHAMBER CONTAMINATING DELAY APPARATUS
摘要 The present invention relates to an apparatus to suppress the pollution of a window which is used in a self-plasma chamber. The self-plasma chamber in the self-plasma chamber pollution suppressing apparatus is connected to a vent pipe of a process chamber and forms a plasma state by making reaction gas in the process chamber flow into the self-plasma chamber. A technical point of the self-plasma chamber pollution suppressing apparatus is to include a temperature control means which is installed in the window or flange of the self-plasma chamber and controls the temperature of the window and flange in order to suppress an accumulation reaction by which pollution-causing materials coming from the process chamber are accumulated in the window and the flange. Thereby the present invention minimizes the pollution of the window by hindering the accumulation reaction in which pollutants caused by reaction gas are accumulated in the window and the flange by heating or cooling the window or the flange according to the type of the reaction gas.
申请公布号 KR20140136142(A) 申请公布日期 2014.11.28
申请号 KR20130056244 申请日期 2013.05.20
申请人 NANOTEK INC.;KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION 发明人 CHA, DONG HO;NAM, YUN SEOK
分类号 H05H1/28;H05H1/34 主分类号 H05H1/28
代理机构 代理人
主权项
地址
您可能感兴趣的专利